Authors

Latypov, Azat; Khaira, Damon; Fenger, Germain; Sturtevant, John; Wei, Chih-I; De Bisschop, Peter

Conference

Extreme Ultraviolet (EUV) Lithography XI; 113230L (2020)

Title

Probability prediction of EUV process failure due to resist-exposure stochastic: applications of Gaussian random fields excursions and Rice's formula

Publication type

Proceedings paper