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Probability prediction of EUV process failure due to resist-exposure stochastic: applications of Gaussian random fields excursions and Rice's formula

dc.contributor.authorLatypov, Azat
dc.contributor.authorKhaira, Damon
dc.contributor.authorFenger, Germain
dc.contributor.authorSturtevant, John
dc.contributor.authorWei, Chih-I
dc.contributor.authorDe Bisschop, Peter
dc.date.accessioned2021-10-28T23:42:01Z
dc.date.available2021-10-28T23:42:01Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35441
dc.sourceIIOimport
dc.titleProbability prediction of EUV process failure due to resist-exposure stochastic: applications of Gaussian random fields excursions and Rice's formula
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.source.peerreviewyes
dc.source.beginpage113230L
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography XI; 113230L (2020)
dc.source.conferencedate23/02/2020
dc.source.conferencelocationSan Jose USA
dc.identifier.urlhttps://doi.org/10.1117/12.2551965
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11323


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