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Characterisation of mechanical stresses of device isolation structures by micro-Raman spectroscopy and modelling

dc.contributor.authorJones, S. K.
dc.contributor.authorAhmed, M.
dc.contributor.authorBazley, D. J.
dc.contributor.authorBeanland, R. J.
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorHill, C.
dc.contributor.authorRothwell, W. J.
dc.date.accessioned2021-10-06T11:27:50Z
dc.date.available2021-10-06T11:27:50Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3544
dc.sourceIIOimport
dc.titleCharacterisation of mechanical stresses of device isolation structures by micro-Raman spectroscopy and modelling
dc.typeProceedings paper
dc.contributor.imecauthorDe Wolf, Ingrid
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage60
dc.source.endpage75
dc.source.conferenceAnalytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes
dc.source.conferencedate16/09/1999
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. PV 99-16


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