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dc.contributor.authorLoo, Roger
dc.contributor.authorPorret, Clément
dc.contributor.authorHan, Han
dc.contributor.authorDepauw, Valerie
dc.date.accessioned2021-10-29T00:11:00Z
dc.date.available2021-10-29T00:11:00Z
dc.date.issued2020-07
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35503
dc.sourceIIOimport
dc.titleEpitaxial Ge-on-nothing virtual substrates for 3D device stacking technologies
dc.typeMeeting abstract
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorPorret, Clément
dc.contributor.imecauthorHan, Han
dc.contributor.imecauthorDepauw, Valerie
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.contributor.orcidimecHan, Han::0000-0003-2169-8332
dc.contributor.orcidimecDepauw, Valerie::0000-0003-2045-9698
dc.source.peerreviewyes
dc.source.beginpage136840
dc.source.conferenceECS-2020 Fall Meeting, Symposium: SiGe, Ge & Related Compounds: Materials, Processing and Devices
dc.source.conferencedate4/10/2020
dc.source.conferencelocationHonolulu, HI USA
dc.identifier.urlhttps://ecs.confex.com/ecs/prime2020/meetingapp.cgi/Paper/136840
imec.availabilityPublished - imec


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