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The optimization of the cleaning process to remove residual bonds of SiC and Si-F after fluorocarbon plasma etch on the silicon surface
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1897 since deposited on 2021-10-06
1last month
Acq. date: 2026-01-07
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Metrics
Views
1897 since deposited on 2021-10-06
1last month
Acq. date: 2026-01-07
Citations