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Fabrication and replication of high efficiency blazed gratings with grayscale electron beam lithography and UV nanoimprint lithography

dc.contributor.authorMattelin, Marie
dc.contributor.authorRadosavljevic, Ana
dc.contributor.authorMissinne, Jeroen
dc.contributor.authorCuypers, Dieter
dc.contributor.authorKommeren, Sander
dc.contributor.authorVandael, Jos
dc.contributor.authorter Meulen, Jan Matthijs
dc.contributor.authorVerduyckt, Luc
dc.contributor.authorVan Steenberge, Geert
dc.date.accessioned2021-10-29T00:38:50Z
dc.date.available2021-10-29T00:38:50Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35562
dc.sourceIIOimport
dc.titleFabrication and replication of high efficiency blazed gratings with grayscale electron beam lithography and UV nanoimprint lithography
dc.typeProceedings paper
dc.contributor.imecauthorMattelin, Marie
dc.contributor.imecauthorRadosavljevic, Ana
dc.contributor.imecauthorMissinne, Jeroen
dc.contributor.imecauthorCuypers, Dieter
dc.contributor.imecauthorVan Steenberge, Geert
dc.contributor.orcidimecMissinne, Jeroen::0000-0002-3470-620X
dc.contributor.orcidimecCuypers, Dieter::0000-0003-0550-6273
dc.contributor.orcidimecVan Steenberge, Geert::0000-0001-8574-1235
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1129204
dc.source.conferenceAdvanced Fabrication Technologies for Micro/Nano Optics and Photonics XIII
dc.source.conferencedate2/02/2020
dc.source.conferencelocationSan Francisco, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2542171
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11292


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