Characterization of the post dry etch cleaning of the silicon surface prior to silicon epitaxial growth

dc.contributor.author	Kim, Young-Chang
dc.contributor.author	Caymax, Matty
dc.contributor.author	Bender, Hugo
dc.contributor.author	Vanhaelemeersch, Serge
dc.date.accessioned	2021-10-06T11:30:40Z
dc.date.available	2021-10-06T11:30:40Z
dc.date.issued	1999
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/3558
dc.source	IIOimport
dc.title	Characterization of the post dry etch cleaning of the silicon surface prior to silicon epitaxial growth
dc.type	Proceedings paper
dc.contributor.imecauthor	Caymax, Matty
dc.contributor.imecauthor	Bender, Hugo
dc.contributor.imecauthor	Vanhaelemeersch, Serge
dc.contributor.orcidimec	Vanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.embargo	9999-12-31
dc.source.peerreview	no
dc.source.beginpage	97
dc.source.endpage	100
dc.source.conference	Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon
dc.source.conferencedate	21/09/1998
dc.source.conferencelocation	Oostende Belgium
imec.availability	Published - open access
imec.internalnotes	Solid State Phenomena; Vols. 65-66