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Characterization of the post dry etch cleaning of the silicon surface prior to silicon epitaxial growth
Publication:
Characterization of the post dry etch cleaning of the silicon surface prior to silicon epitaxial growth
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Date
1999
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kim, Young-Chang
;
Caymax, Matty
;
Bender, Hugo
;
Vanhaelemeersch, Serge
Journal
Abstract
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1897
since deposited on 2021-10-06
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last month
Acq. date: 2025-12-09
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Metrics
Views
1897
since deposited on 2021-10-06
4
last month
Acq. date: 2025-12-09
Citations