Characterization of the post dry etch cleaning of the silicon surface prior to silicon epitaxial growth

dc.contributor.author	Kim, Young-Chang
dc.contributor.author	Caymax, Matty
dc.contributor.author	Bender, Hugo
dc.contributor.author	Vanhaelemeersch, Serge
dc.contributor.imecauthor	Caymax, Matty
dc.contributor.imecauthor	Bender, Hugo
dc.contributor.imecauthor	Vanhaelemeersch, Serge
dc.contributor.orcidimec	Vanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.accessioned	2021-10-06T11:30:40Z
dc.date.available	2021-10-06T11:30:40Z
dc.date.embargo	9999-12-31
dc.date.issued	1999
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/3558
dc.source.beginpage	97
dc.source.conference	Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon
dc.source.conferencedate	21/09/1998
dc.source.conferencelocation	Oostende Belgium
dc.source.endpage	100
dc.title	Characterization of the post dry etch cleaning of the silicon surface prior to silicon epitaxial growth
dc.type	Proceedings paper
dspace.entity.type	Publication
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