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Controlled isotropic etches for Gate-All-Around (GAA) device architectures

dc.contributor.authorMuraki, Yusuke
dc.contributor.authorOniki, Yusuke
dc.contributor.authorKenis, Karine
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorKal, Subhadeep
dc.contributor.authorAlix, Cheryl
dc.contributor.authorKumar, Kaushik
dc.contributor.authorMosden, Aelan
dc.date.accessioned2021-10-29T01:11:01Z
dc.date.available2021-10-29T01:11:01Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35627
dc.sourceIIOimport
dc.titleControlled isotropic etches for Gate-All-Around (GAA) device architectures
dc.typeOral presentation
dc.contributor.imecauthorMuraki, Yusuke
dc.contributor.imecauthorOniki, Yusuke
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorKumar, Kaushik
dc.contributor.orcidimecOniki, Yusuke::0000-0002-6619-1327
dc.source.peerreviewno
dc.source.conferenceSurface Preparation and Cleaning Conference - SPCC
dc.source.conferencedate1/04/2020
dc.source.conferencelocationonline online
dc.identifier.urlhttps://www.linx-consulting.com/wp-content/uploads/2020/08/LINX_SPCC2020_Agenda_R12.pdf
imec.availabilityPublished - imec


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