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The EUV CNT pellicle: balancing material properties to optimize performance

dc.contributor.authorPollentier, Ivan
dc.contributor.authorTimmermans, Marina
dc.contributor.authorHuyghebaert, Cedric
dc.contributor.authorBrems, Steven
dc.contributor.authorGallagher, Emily
dc.date.accessioned2021-10-29T02:16:44Z
dc.date.available2021-10-29T02:16:44Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35751
dc.sourceIIOimport
dc.titleThe EUV CNT pellicle: balancing material properties to optimize performance
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorTimmermans, Marina
dc.contributor.imecauthorHuyghebaert, Cedric
dc.contributor.imecauthorBrems, Steven
dc.contributor.imecauthorGallagher, Emily
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecTimmermans, Marina::0000-0001-9805-8259
dc.contributor.orcidimecHuyghebaert, Cedric::0000-0001-6043-7130
dc.contributor.orcidimecBrems, Steven::0000-0002-0282-8528
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage113231G
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography XI
dc.source.conferencedate23/02/2020
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2552357
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPEI; Vol. 11323


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