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Extending EUV lithography for DRAM applications

dc.contributor.authorRispens, Gijsbert
dc.contributor.authorVan Lare, C.
dc.contributor.authorOorschot, D.
dc.contributor.authorHoefnagels, R.
dc.contributor.authorLiu, S.
dc.contributor.authorVan Mierlo, W.
dc.contributor.authorZuurbier, N.
dc.contributor.authorDardani, Z.
dc.contributor.authorWang, Z.
dc.contributor.authorMaslow, M.
dc.contributor.authorFinders, J.
dc.contributor.authorFallica, Roberto
dc.contributor.authorFrommhold, Andreas
dc.contributor.authorHendrickx, Eric
dc.contributor.authorNiroomand, A.
dc.contributor.authorLight, S.
dc.date.accessioned2021-10-29T03:04:51Z
dc.date.available2021-10-29T03:04:51Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35836
dc.sourceIIOimport
dc.titleExtending EUV lithography for DRAM applications
dc.typeProceedings paper
dc.contributor.imecauthorRispens, Gijsbert
dc.contributor.imecauthorFallica, Roberto
dc.contributor.imecauthorFrommhold, Andreas
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.contributor.orcidimecFrommhold, Andreas::0000-0001-6824-5643
dc.source.peerreviewyes
dc.source.beginpage113230U
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography XI
dc.source.conferencedate20/02/2020
dc.source.conferencelocationSan Jose USA
dc.identifier.urlhttps://www.spiedigitallibrary.org/conference-proceedings-of-spie/11323/113230U/Extending-EUV-lithography-for-DRAM-applications/10.1117/12.2552067.full?SSO=1
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11323


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