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Analyses of post metal etch cleaning in downstream H2O-based plasma followed by a wet chemistry
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Analyses of post metal etch cleaning in downstream H2O-based plasma followed by a wet chemistry
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Date
1999
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Li, H.
;
Baklanov, Mikhaïl
;
Boullart, Werner
;
Conard, Thierry
;
Brijs, Bert
;
Maex, Karen
;
Froyen, L.
Journal
J. Electrochem. Soc.
Abstract
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2018
since deposited on 2021-10-14
7
last month
Acq. date: 2025-12-10
Citations
Metrics
Views
2018
since deposited on 2021-10-14
7
last month
Acq. date: 2025-12-10
Citations