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Realizing more accurate OPC models by utilizing SEM contours

dc.contributor.authorWei, C.
dc.contributor.authorSejpal, R.
dc.contributor.authorDeng, Y.
dc.contributor.authorKusnadi, I.
dc.contributor.authorFenger, G.
dc.contributor.authorOya, M.
dc.contributor.authorOkamoto, Y.
dc.contributor.authorMaruyama, K.
dc.contributor.authorYamazaki, Y.
dc.contributor.authorDas, Sayantan
dc.contributor.authorHalder, Sandip
dc.contributor.authorGillijns, Werner
dc.date.accessioned2021-10-29T07:59:07Z
dc.date.available2021-10-29T07:59:07Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36318
dc.sourceIIOimport
dc.titleRealizing more accurate OPC models by utilizing SEM contours
dc.typeProceedings paper
dc.contributor.imecauthorDas, Sayantan
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorGillijns, Werner
dc.contributor.orcidimecDas, Sayantan::0000-0002-3031-0726
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.source.peerreviewyes
dc.source.beginpage1132524
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXIV
dc.source.conferencedate23/03/2020
dc.source.conferencelocationSan Jose,CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2554527
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11325


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