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Stitching enablement for anamorphic imaging: a ~1μm exclusion band and its implications

dc.contributor.authorWiaux, Vincent
dc.contributor.authorBekaert, Joost
dc.contributor.authorKovalevich, Tatiana
dc.contributor.authorRyckaert, Julien
dc.contributor.authorHendrickx, Eric
dc.contributor.authorDavydova, Natalia
dc.contributor.authorWoltgens, Pieter
dc.contributor.authorde Winter, Laurens
dc.contributor.authorMaslow, Mark
dc.contributor.authorTroost, Kars
dc.contributor.authorTien, Ming-Chun
dc.date.accessioned2021-10-29T08:06:34Z
dc.date.available2021-10-29T08:06:34Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36329
dc.sourceIIOimport
dc.titleStitching enablement for anamorphic imaging: a ~1μm exclusion band and its implications
dc.typeProceedings paper
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorKovalevich, Tatiana
dc.contributor.imecauthorRyckaert, Julien
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecWiaux, Vincent::0000-0002-8923-5708
dc.contributor.orcidimecHendrickx, Eric::0000-0003-2516-0417
dc.source.peerreviewyes
dc.source.beginpage1151713
dc.source.conferenceExtreme Ultraviolet Lithography 2020
dc.source.conferencedate21/09/2020
dc.source.conferencelocationMonterey California
dc.identifier.urlhttps://doi.org/10.1117/12.2573155
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11517


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