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Concurrent design rule, OPC and process optimization in EUV lithography

dc.contributor.authorXu, Dongbo
dc.contributor.authorGillijns, Werner
dc.contributor.authorTan, Ling Ee
dc.contributor.authorLee, Jae Uk
dc.contributor.authorKim, Ryan Ryoung han
dc.date.accessioned2021-10-29T08:34:22Z
dc.date.available2021-10-29T08:34:22Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36370
dc.sourceIIOimport
dc.titleConcurrent design rule, OPC and process optimization in EUV lithography
dc.typeMeeting abstract
dc.contributor.imecauthorXu, Dongbo
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorTan, Ling Ee
dc.contributor.imecauthorLee, Jae Uk
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.orcidimecXu, Dongbo::0000-0003-1159-2315
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecTan, Ling Ee::0000-0002-3143-5176
dc.contributor.orcidimecLee, Jae Uk::0000-0002-9434-5055
dc.source.peerreviewno
dc.source.beginpage1132804
dc.source.conferenceDesign-Process-Technology Co-optimization for Manufacturability XIV
dc.source.conferencedate23/02/2020
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2553212
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11328


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