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Plasma process induced damage on CMOS-integrated ion-sensitive field effect transistors

dc.contributor.authorMaes, D.
dc.contributor.authorVan Steenkiste, Filip
dc.contributor.authorHaspeslagh, Luc
dc.contributor.authorBaert, Kris
dc.contributor.authorGumbrecht, W.
dc.date.accessioned2021-10-14T11:29:52Z
dc.date.available2021-10-14T11:29:52Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3643
dc.sourceIIOimport
dc.titlePlasma process induced damage on CMOS-integrated ion-sensitive field effect transistors
dc.typeOral presentation
dc.contributor.imecauthorHaspeslagh, Luc
dc.source.peerreviewno
dc.source.conference1st European Symposium on Plasma Process Induced Damage (ESPID'1); 25-26 November 1999; Toulouse, France.
dc.source.conferencelocation
imec.availabilityPublished - imec


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