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Spectroscopy: A new route towards critical-dimension metrology of the cavity etch of nanosheet transistors

dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorOniki, Yusuke
dc.contributor.authorKenis, Karine
dc.contributor.authorMuraki, Yusuke
dc.contributor.authorNuytten, Thomas
dc.contributor.authorSergeant, Stefanie
dc.contributor.authorFranquet, Alexis
dc.contributor.authorSpampinato, Valentina
dc.contributor.authorConard, Thierry
dc.contributor.authorHoflijk, Ilse
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorClaessens, Niels
dc.contributor.authorMoussa, Alain
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorHung, Joey
dc.contributor.authorKoret, Roy
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorLeray, Philippe
dc.date.accessioned2021-10-31T08:08:27Z
dc.date.available2021-10-31T08:08:27Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36524
dc.sourceIIOimport
dc.titleSpectroscopy: A new route towards critical-dimension metrology of the cavity etch of nanosheet transistors
dc.typeProceedings paper
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorOniki, Yusuke
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMuraki, Yusuke
dc.contributor.imecauthorNuytten, Thomas
dc.contributor.imecauthorSergeant, Stefanie
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorSpampinato, Valentina
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorHoflijk, Ilse
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorClaessens, Niels
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorHung, Joey
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorLeray, Philippe
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.contributor.orcidimecOniki, Yusuke::0000-0002-6619-1327
dc.contributor.orcidimecNuytten, Thomas::0000-0002-5921-6928
dc.contributor.orcidimecSergeant, Stefanie::0000-0001-9923-0903
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecSpampinato, Valentina::0000-0003-3225-6740
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecClaessens, Niels::0000-0002-8863-9532
dc.source.peerreviewyes
dc.source.beginpage116111Q
dc.source.conferenceMetrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
dc.source.conferencedate21/02/2021
dc.source.conferencelocationvirtual virtual
dc.identifier.urlhttps://doi.org/10.1117/12.2581800
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11611


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