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Lloyd's Mirror Interference Lithography Below a 22-nm Pitch with an Accessible, Table-top, 13.5 nm High-Harmonic EUV Source

dc.contributor.authorDorney, Kevin
dc.contributor.authorCastellanos, Sonia
dc.contributor.authorWitting Larsen, Esben
dc.contributor.authorHolzmeier, Fabian
dc.contributor.authorSingh, Dhirendra Pratap
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorDe Schepper, Peter
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorBargsten, Clayton
dc.contributor.authorCousin, Seth
dc.contributor.authorRaymondson, Daisy
dc.contributor.authorRinard, Eric
dc.contributor.authorWard, Rod
dc.contributor.authorKapteyn, Henry
dc.contributor.authorNuytten, Thomas
dc.contributor.authorvan der Heide, Paul
dc.contributor.authorPetersen, John
dc.date.accessioned2021-10-31T08:32:12Z
dc.date.available2021-10-31T08:32:12Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36683
dc.sourceIIOimport
dc.titleLloyd's Mirror Interference Lithography Below a 22-nm Pitch with an Accessible, Table-top, 13.5 nm High-Harmonic EUV Source
dc.typeProceedings paper
dc.contributor.imecauthorDorney, Kevin
dc.contributor.imecauthorWitting Larsen, Esben
dc.contributor.imecauthorHolzmeier, Fabian
dc.contributor.imecauthorSingh, Dhirendra Pratap
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorDe Schepper, Peter
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorNuytten, Thomas
dc.contributor.imecauthorvan der Heide, Paul
dc.contributor.imecauthorPetersen, John
dc.contributor.orcidimecDorney, Kevin::0000-0003-2097-6994
dc.contributor.orcidimecWitting Larsen, Esben::0000-0002-6294-0896
dc.contributor.orcidimecHolzmeier, Fabian::0000-0001-8749-5330
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecNuytten, Thomas::0000-0002-5921-6928
dc.contributor.orcidimecvan der Heide, Paul::0000-0001-6292-0329
dc.source.peerreviewno
dc.source.conferenceSPIE Advanced Lithography Novel Patterning Technologies 2021
dc.source.conferencedate22/02/2021
dc.source.conferencelocationonline online
imec.availabilityPublished - imec


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