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Surface cleaning issues in thin-oxide technology

dc.contributor.authorMertens, Paul
dc.contributor.authorBearda, Twan
dc.contributor.authorHoussa, Michel
dc.contributor.authorLoewenstein, Lee
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVos, Rita
dc.contributor.authorKenis, Karine
dc.contributor.authorNaili, Mohamed
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T11:30:40Z
dc.date.available2021-10-14T11:30:40Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3673
dc.sourceIIOimport
dc.titleSurface cleaning issues in thin-oxide technology
dc.typeOral presentation
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference30th IEEE Semiconductor Interface Specialists' Conference
dc.source.conferencedate2/12/1999
dc.source.conferencelocationCharleston, VA USA
imec.availabilityPublished - open access


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