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Distribution of metal contamination in SiO2/Si systems

dc.contributor.authorMertens, Paul
dc.contributor.authorJacobs, Leon
dc.contributor.authorGoris, Karen
dc.contributor.authorKenis, Karine
dc.contributor.authorLoewenstein, Lee
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorBearda, Twan
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVos, Rita
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T11:30:47Z
dc.date.available2021-10-14T11:30:47Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3676
dc.sourceIIOimport
dc.titleDistribution of metal contamination in SiO2/Si systems
dc.typeMeeting abstract
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1107
dc.source.conferenceElectrochemical Society Fall Meeting: 6th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate17/10/1999
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access
imec.internalnotesMeeting Abstracts; Vol. 99-2


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