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Cutting-edge epitaxial processes for sub 3 nm technology nodes: application to nanosheet stacks and epitaxial wrap-around contacts

dc.contributor.authorHikavyy, Andriy
dc.contributor.authorPorret, Clément
dc.contributor.authorMencarelli, M.
dc.contributor.authorLoo, Roger
dc.contributor.authorFavia, Paola
dc.contributor.authorAyyad, Mustafa
dc.contributor.authorBriggs, Basoene
dc.contributor.authorLanger, Robert
dc.contributor.authorHoriguchi, Naoto
dc.date.accessioned2021-10-31T08:55:48Z
dc.date.available2021-10-31T08:55:48Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36787
dc.sourceIIOimport
dc.titleCutting-edge epitaxial processes for sub 3 nm technology nodes: application to nanosheet stacks and epitaxial wrap-around contacts
dc.typeProceedings paper
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorPorret, Clément
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorAyyad, Mustafa
dc.contributor.imecauthorBriggs, Basoene
dc.contributor.imecauthorLanger, Robert
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecLanger, Robert::0000-0002-1132-3468
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.source.peerreviewyes
dc.source.beginpage139
dc.source.endpage146
dc.source.conference240th ECS Meeting Symposiusm: Semiconductor Process Integration 12
dc.source.conferencedate10/10/2021
dc.source.conferencelocationonline online
dc.identifier.urlhttps://iopscience.iop.org/article/10.1149/10404.0139ecst/meta
imec.availabilityPublished - imec
imec.internalnotesECS Transactions, Volume 104, Number 4


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