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Implementation of the IMEC-Clean in advanced CMOS manufacturing

dc.contributor.authorMeuris, Marc
dc.contributor.authorArnauts, Sophia
dc.contributor.authorCornelissen, Ingrid
dc.contributor.authorKenis, Karine
dc.contributor.authorLux, Marcel
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorMertens, Paul
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorVos, Rita
dc.contributor.authorLoewenstein, Lee
dc.contributor.authorHeyns, Marc
dc.contributor.authorWolke, K.
dc.date.accessioned2021-10-14T11:30:51Z
dc.date.available2021-10-14T11:30:51Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3678
dc.sourceIIOimport
dc.titleImplementation of the IMEC-Clean in advanced CMOS manufacturing
dc.typeProceedings paper
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorCornelissen, Ingrid
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage157
dc.source.endpage160
dc.source.conferenceProceedings 1999 IEEE International Symposium on Semiconductor Manufacturing Conference
dc.source.conferencedate11/10/1999
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec


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