Two-dimensional feature stochastic printing with mask deficiencies in high-NA EUV

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Authors
Melvin III, Lawrence; Jonckheere, Rik; Hendrickx, Eric
DOI
10.1117/12.2584775
Conference
Extreme Ultraviolet (EUV) Lithography XII
Title
Two-dimensional feature stochastic printing with mask deficiencies in high-NA EUV
Publication type
Oral presentation
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