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Two-dimensional feature stochastic printing with mask deficiencies in high-NA EUV

dc.contributor.authorMelvin III, Lawrence
dc.contributor.authorJonckheere, Rik
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2021-10-31T09:51:07Z
dc.date.available2021-10-31T09:51:07Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36967
dc.sourceIIOimport
dc.titleTwo-dimensional feature stochastic printing with mask deficiencies in high-NA EUV
dc.typeOral presentation
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.identifier.doi10.1117/12.2584775
dc.source.peerreviewyes
dc.source.beginpage116091S
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography XII
dc.source.conferencedate21/02/2021
dc.source.conferencelocationonline
dc.identifier.urlhttps://doi.org/10.1117/12.2584775
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11609


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