Publication:
Plasma impact on the HfO2 high-k dielectric: Continuous-Wave plasma etch versus Quasi-Atomic Layer etch
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1769 since deposited on 2021-10-31
Acq. date: 2026-01-11
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Metrics
Views
1769 since deposited on 2021-10-31
Acq. date: 2026-01-11
Citations