dc.contributor.author | Radisic, Dunja | |
dc.contributor.author | Smets, Quentin | |
dc.contributor.author | Schram, Tom | |
dc.date.accessioned | 2021-10-31T10:32:21Z | |
dc.date.available | 2021-10-31T10:32:21Z | |
dc.date.issued | 2021 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/37079 | |
dc.source | IIOimport | |
dc.title | Plasma impact on the HfO2 high-k dielectric: Continuous-Wave plasma etch versus Quasi-Atomic Layer etch | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Radisic, Dunja | |
dc.contributor.imecauthor | Smets, Quentin | |
dc.contributor.imecauthor | Schram, Tom | |
dc.contributor.orcidimec | Smets, Quentin::0000-0002-2356-5915 | |
dc.contributor.orcidimec | Schram, Tom::0000-0003-1533-7055 | |
dc.source.peerreview | no | |
dc.source.beginpage | AA4-1 | |
dc.source.conference | ALD/ALE 2021 | |
dc.source.conferencedate | 27/06/2021 | |
dc.source.conferencelocation | Tampa, FL USA | |
imec.availability | Published - imec | |