Show simple item record

Plasma impact on the HfO2 high-k dielectric: Continuous-Wave plasma etch versus Quasi-Atomic Layer etch

dc.contributor.authorRadisic, Dunja
dc.contributor.authorSmets, Quentin
dc.contributor.authorSchram, Tom
dc.date.accessioned2021-10-31T10:32:21Z
dc.date.available2021-10-31T10:32:21Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37079
dc.sourceIIOimport
dc.titlePlasma impact on the HfO2 high-k dielectric: Continuous-Wave plasma etch versus Quasi-Atomic Layer etch
dc.typeMeeting abstract
dc.contributor.imecauthorRadisic, Dunja
dc.contributor.imecauthorSmets, Quentin
dc.contributor.imecauthorSchram, Tom
dc.contributor.orcidimecSmets, Quentin::0000-0002-2356-5915
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.source.peerreviewno
dc.source.beginpageAA4-1
dc.source.conferenceALD/ALE 2021
dc.source.conferencedate27/06/2021
dc.source.conferencelocationTampa, FL USA
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record