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Towards Si-cap-free SiGe passivation: impact of surface preparation on low-pressure oxidation of SiGe

dc.contributor.authorWostyn, Kurt
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorKimura, Yosuke
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorRondas, Dirk
dc.contributor.authorConard, Thierry
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorHoriguchi, Naoto
dc.date.accessioned2021-10-31T12:46:54Z
dc.date.available2021-10-31T12:46:54Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37381
dc.sourceIIOimport
dc.titleTowards Si-cap-free SiGe passivation: impact of surface preparation on low-pressure oxidation of SiGe
dc.typeMeeting abstract
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorKimura, Yosuke
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorRondas, Dirk
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.source.peerreviewno
dc.source.beginpage49
dc.source.endpage53
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces Conference - UCPSS
dc.source.conferencedate22/09/2020
dc.source.conferencelocationMechelen Belgium
dc.identifier.urlhttps://doi.org/10.4028/www.scientific.net/SSP.314.49
imec.availabilityPublished - imec
imec.internalnotespostponed to April 2021 Solid State Phenomena; Vol. 314


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