dc.contributor.author | Onitsuka, Tomoya | |
dc.contributor.author | Kawakami, Shinichiro | |
dc.contributor.author | Dauendorffer, Arnaud | |
dc.contributor.author | Shimura, Satoru | |
dc.contributor.author | Nafus, Kathleen | |
dc.contributor.author | Feurprier, Yannick | |
dc.contributor.author | Foubert, Philippe | |
dc.contributor.author | De Simone, Danilo | |
dc.date.accessioned | 2023-01-17T08:12:40Z | |
dc.date.available | 2021-11-02T15:58:32Z | |
dc.date.available | 2023-01-17T08:12:40Z | |
dc.date.issued | 2021 | |
dc.identifier.isbn | 978-1-5106-4051-1 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000672825700034 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/37692.2 | |
dc.source | WOS | |
dc.title | Novel processing technologies for advanced EUV patterning materials using metal oxide resist (MOR) | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Foubert, Philippe | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.identifier.doi | 10.1117/12.2583809 | |
dc.identifier.eisbn | 978-1-5106-4052-8 | |
dc.source.numberofpages | 7 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 116091L | |
dc.source.conference | Conference on Extreme Ultraviolet (EUV) Lithography XII | |
dc.source.conferencedate | FEB 22-26, 2021 | |
dc.source.conferencelocation | Virtual | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 11609 | |
imec.availability | Published - imec | |