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EUV Single Patterning Exploration for Pitch 28 nm
dc.contributor.author | Xu, Dongbo | |
dc.contributor.author | Gillijns, Werner | |
dc.contributor.author | Drissi, Youssef | |
dc.contributor.author | Tan, Ling Ee | |
dc.contributor.author | Oak, Apoorva | |
dc.contributor.author | Kim, Ryan Ryoung han | |
dc.contributor.editor | Yuan, Chi-Min | |
dc.contributor.editor | Kim, Ryan Ryoung | |
dc.date.accessioned | 2022-05-17T07:57:01Z | |
dc.date.available | 2021-11-02T15:59:40Z | |
dc.date.available | 2022-05-17T07:57:01Z | |
dc.date.issued | 2021-02-22 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000672647800018 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/37771.2 | |
dc.source | WOS | |
dc.title | EUV Single Patterning Exploration for Pitch 28 nm | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Xu, Dongbo | |
dc.contributor.imecauthor | Gillijns, Werner | |
dc.contributor.imecauthor | Drissi, Youssef | |
dc.contributor.imecauthor | Tan, Ling Ee | |
dc.contributor.imecauthor | Oak, Apoorva | |
dc.contributor.imecauthor | Kim, Ryan Ryoung han | |
dc.contributor.orcidimec | Xu, Dongbo::0000-0003-1159-2315 | |
dc.contributor.orcidimec | Gillijns, Werner::0000-0002-2430-7360 | |
dc.contributor.orcidimec | Tan, Ling Ee::0000-0002-3143-5176 | |
dc.contributor.orcidimec | Oak, Apoorva::0000-0002-0926-848X | |
dc.identifier.doi | 10.1117/12.2584730 | |
dc.identifier.eisbn | 978-1-5106-4062-7 | |
dc.source.numberofpages | 12 | |
dc.source.peerreview | no | |
dc.source.conference | Conference on Design-Process-Technology Co-optimization XV | |
dc.source.conferencedate | FEB 22-26, 2021 | |
dc.source.conferencelocation | online | |
dc.source.journal | SPIE paper | |
dc.source.volume | 11614 | |
imec.availability | Under review |