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Cyclic Plasma Halogenation of Amorphous Carbon for Defect-Free Area-Selective Atomic Layer Deposition of Titanium Oxide
Publication:
Cyclic Plasma Halogenation of Amorphous Carbon for Defect-Free Area-Selective Atomic Layer Deposition of Titanium Oxide
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Date
2021
Journal article
https://doi.org/10.1021/acsami.1c04405
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Krishtab, Mikhail
;
Armini, Silvia
;
Meersschaut, Johan
;
De Gendt, Stefan
;
Ameloot, Rob
Journal
ACS APPLIED MATERIALS & INTERFACES
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1928
since deposited on 2021-11-02
1
last month
Acq. date: 2025-12-09
Citations
Metrics
Views
1928
since deposited on 2021-11-02
1
last month
Acq. date: 2025-12-09
Citations