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Application of a new approach to optical proximity correction

dc.contributor.authorRosenbusch, A.
dc.contributor.authorHourd, A.
dc.contributor.authorJuffermans, Casper
dc.contributor.authorKirsch, H.
dc.contributor.authorLalanne, F.
dc.contributor.authorMaurer, W.
dc.contributor.authorRomeo, C.
dc.contributor.authorRonse, Kurt
dc.contributor.authorSchiavone, P.
dc.contributor.authorSimecek, M.
dc.contributor.authorToublan, O.
dc.contributor.authorVermeulen, Tom
dc.contributor.authorWatson, J.
dc.contributor.authorZiegler, W.
dc.contributor.authorZimmerman, R.
dc.date.accessioned2021-10-14T11:35:53Z
dc.date.available2021-10-14T11:35:53Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3781
dc.sourceIIOimport
dc.titleApplication of a new approach to optical proximity correction
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage639
dc.source.endpage647
dc.source.conferenceOptical Microlithography XII
dc.source.conferencedate17/03/1999
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 3679


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