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Role of UV/chlorine exposure during dry surface conditioning before integrated epi deposition process

dc.contributor.authorRuzyllo, Jerzy
dc.contributor.authorRöhr, Erika
dc.contributor.authorCaymax, Matty
dc.contributor.authorBaeyens, Martien
dc.contributor.authorConard, Thierry
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T11:36:23Z
dc.date.available2021-10-14T11:36:23Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3788
dc.sourceIIOimport
dc.titleRole of UV/chlorine exposure during dry surface conditioning before integrated epi deposition process
dc.typeProceedings paper
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage233
dc.source.endpage236
dc.source.conferenceUltra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenmomena; Vols. 65-66


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