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Evaluation of advanced I-line resists for practical 0.5*(l/NA) lithography

dc.contributor.authorTzviatkov, Plamen
dc.contributor.authorPforr, Rainer
dc.contributor.authorJaenen, Patrick
dc.contributor.authorVertommen, Johan
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-29T12:49:06Z
dc.date.available2021-09-29T12:49:06Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/382
dc.sourceIIOimport
dc.titleEvaluation of advanced I-line resists for practical 0.5*(l/NA) lithography
dc.typeProceedings paper
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorVan den hove, Luc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage105
dc.source.endpage124
dc.source.conferenceOCG Microlithography Seminar INTERFACE
dc.source.conferencedate6/11/1994
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - open access


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