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Film Characterization of Low-Temperature Silicon Carbon Nitride for Direct Bonding Applications
dc.contributor.author | Nagano, F. | |
dc.contributor.author | Iacovo, S. | |
dc.contributor.author | Phommahaxay, A. | |
dc.contributor.author | Inoue, F. | |
dc.contributor.author | Sleeckx, E. | |
dc.contributor.author | Beyer, G. | |
dc.contributor.author | Beyne, E. | |
dc.contributor.author | De. Gendt, S. | |
dc.date.accessioned | 2021-11-02T16:06:48Z | |
dc.date.available | 2021-11-02T16:06:48Z | |
dc.date.issued | 2020-DEC 1 | |
dc.identifier.issn | 2162-8769 | |
dc.identifier.other | WOS:000602991700001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/38304 | |
dc.source | WOS | |
dc.title | Film Characterization of Low-Temperature Silicon Carbon Nitride for Direct Bonding Applications | |
dc.type | Journal article | |
dc.contributor.imecauthor | Nagano, F. | |
dc.contributor.imecauthor | Iacovo, S. | |
dc.contributor.imecauthor | Phommahaxay, A. | |
dc.contributor.imecauthor | Inoue, F. | |
dc.contributor.imecauthor | Sleeckx, E. | |
dc.contributor.imecauthor | Beyer, G. | |
dc.contributor.imecauthor | Beyne, E. | |
dc.contributor.imecauthor | De. Gendt, S. | |
dc.contributor.orcidimec | Nagano, F.::0000-0001-5315-8694 | |
dc.contributor.orcidimec | Inoue, F.::0000-0003-2292-846X | |
dc.contributor.orcidimec | Beyne, E.::0000-0002-3096-050X | |
dc.identifier.doi | 10.1149/2162-8777/abd260 | |
dc.source.numberofpages | 7 | |
dc.source.peerreview | yes | |
dc.source.journal | ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY | |
dc.source.issue | 12 | |
dc.source.volume | 9 | |
imec.availability | Under review |
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