Publication:

High yield and process uniformity for 300 mm integrated WS2 FETs

Date

2021
Meeting abstract
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Author(s)

Schram, Tom  
;
Smets, Quentin  
;
Radisic, Dunja  
;
Groven, Benjamin  
;
Thiam, Arame  
;
Li, Waikin  
;
Dupuy, Emmanuel  
;
Vandersmissen, Kevin  
;
Maurice, Thibaut  
;
Asselberghs, Inge  
;
Radu, Iuliana  

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NA

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1290 since deposited on 2021-11-19
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1782 since deposited on 2021-11-19
3last month
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Acq. date: 2026-04-06

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