Publication:

High yield and process uniformity for 300 mm integrated WS2 FETs

Date

2021
Meeting abstract
Simple item page Full metadata Statistics
Loading...
Thumbnail Image

Files

Published version 885.9 KB

Author(s)

Schram, Tom  
;
Smets, Quentin  
;
Radisic, Dunja  
;
Groven, Benjamin  
;
Thiam, Arame  
;
Li, Waikin  
;
Dupuy, Emmanuel  
;
Vandersmissen, Kevin  
;
Maurice, Thibaut  
;
Asselberghs, Inge  
;
Radu, Iuliana  

Journal

NA

Abstract

Description

Metrics

Downloads

1028 since deposited on 2021-11-19
95last month
20last week
Acq. date: 2026-01-12

Views

1777 since deposited on 2021-11-19
5last month
1last week
Acq. date: 2026-01-12

Citations

Metrics

Downloads

1028 since deposited on 2021-11-19
95last month
20last week
Acq. date: 2026-01-12

Views

1777 since deposited on 2021-11-19
5last month
1last week
Acq. date: 2026-01-12

Citations