dc.contributor.author | Schram, Tom | |
dc.contributor.author | Smets, Quentin | |
dc.contributor.author | Radisic, Dunja | |
dc.contributor.author | Groven, Benjamin | |
dc.contributor.author | Thiam, Arame | |
dc.contributor.author | Li, Waikin | |
dc.contributor.author | Dupuy, Emmanuel | |
dc.contributor.author | Vandersmissen, Kevin | |
dc.contributor.author | Maurice, Thibaut | |
dc.contributor.author | Asselberghs, Inge | |
dc.contributor.author | Radu, Iuliana | |
dc.date.accessioned | 2022-09-22T09:05:48Z | |
dc.date.available | 2021-11-19T13:21:51Z | |
dc.date.available | 2022-09-22T09:05:48Z | |
dc.date.issued | 2021 | |
dc.identifier.issn | NA | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/38445.2 | |
dc.title | High yield and process uniformity for 300 mm integrated WS2 FETs | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Schram, Tom | |
dc.contributor.imecauthor | Smets, Quentin | |
dc.contributor.imecauthor | Radisic, Dunja | |
dc.contributor.imecauthor | Groven, Benjamin | |
dc.contributor.imecauthor | Thiam, Arame | |
dc.contributor.imecauthor | Li, Waikin | |
dc.contributor.imecauthor | Dupuy, Emmanuel | |
dc.contributor.imecauthor | Vandersmissen, Kevin | |
dc.contributor.imecauthor | Maurice, Thibaut | |
dc.contributor.imecauthor | Asselberghs, Inge | |
dc.contributor.imecauthor | Radu, Iuliana | |
dc.contributor.orcidimec | Schram, Tom::0000-0003-1533-7055 | |
dc.contributor.orcidimec | Smets, Quentin::0000-0002-2356-5915 | |
dc.contributor.orcidimec | Groven, Benjamin::0000-0002-5781-7594 | |
dc.contributor.orcidimec | Dupuy, Emmanuel::0000-0003-3341-1618 | |
dc.contributor.orcidimec | Radu, Iuliana::0000-0002-7230-7218 | |
dc.contributor.orcidimec | Maurice, Thibaut::0000-0002-8919-1071 | |
dc.date.embargo | 2021-06-13 | |
dc.source.numberofpages | 2 | |
dc.source.peerreview | yes | |
dc.subject.discipline | Electrical & electronic engineering | |
dc.source.beginpage | 1 | |
dc.source.endpage | 2 | |
dc.source.conference | Symposium on VLSI Technology | |
dc.source.conferencedate | 13-19 /6/ 2021 | |
dc.source.conferencelocation | Kyoto virtual | |
dc.source.journal | NA | |
imec.availability | Published - open access | |