Authors

Storm, Arjen; Sprey, Hessel; Maes, Jan; Granneman, E.; De Blank, Rene; Röhr, Erika; Caymax, Matty; Heyns, Marc

Conference

Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon

Title

A new HF vapor process for native oxide removal, suited for cluster applications

Publication type

Proceedings paper

Embargo date

9999-12-31