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A new HF vapor process for native oxide removal, suited for cluster applications

dc.contributor.authorStorm, Arjen
dc.contributor.authorSprey, Hessel
dc.contributor.authorMaes, Jan
dc.contributor.authorGranneman, E.
dc.contributor.authorDe Blank, Rene
dc.contributor.authorRöhr, Erika
dc.contributor.authorCaymax, Matty
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T11:41:21Z
dc.date.available2021-10-14T11:41:21Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3857
dc.sourceIIOimport
dc.titleA new HF vapor process for native oxide removal, suited for cluster applications
dc.typeProceedings paper
dc.contributor.imecauthorSprey, Hessel
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorDe Blank, Rene
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorHeyns, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage225
dc.source.endpage228
dc.source.conferenceUltra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenmomena; Vols. 65-66


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