Show simple item record

Characterization of Doping and Activation Processes Using Differential Hall Effect Metrology (DHEM)

dc.contributor.authorJoshi, Abhijeet
dc.contributor.authorRengo, Gianluca
dc.contributor.authorPorret, Clément
dc.contributor.authorLin, Kun-Lin
dc.contributor.authorChang, Chia-He
dc.contributor.authorBasol, Bulent
dc.date.accessioned2022-04-29T07:36:48Z
dc.date.available2021-12-15T16:46:42Z
dc.date.available2022-04-29T07:36:48Z
dc.date.issued2021-05
dc.identifier.issnna
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38611.2
dc.titleCharacterization of Doping and Activation Processes Using Differential Hall Effect Metrology (DHEM)
dc.typeMeeting abstract
dc.contributor.imecauthorRengo, Gianluca
dc.contributor.imecauthorPorret, Clément
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.source.numberofpages1
dc.source.peerreviewno
dc.source.beginpage1009
dc.source.conference239th ECS Meeting: G01: Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post-CMOS Applications 11
dc.source.conferencedate2021/05/30 - 2021/06/03
dc.source.conferencelocationVirtual
dc.source.journalECS Meeting Abstracts
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record

Version history

VersionItemDateSummary
220.500.12860/38611.2*2022-04-29T07:33:56Zvalidation by library/open access desk
120.500.12860/386112021-12-15T16:46:42Z

*Selected version