dc.contributor.author | Kim, Il Hwan | |
dc.contributor.author | Kim, Insung | |
dc.contributor.author | Park, Changmin | |
dc.contributor.author | Lee, Jsiun | |
dc.contributor.author | Ryu, Koungmin | |
dc.contributor.author | De Schepper, P. | |
dc.contributor.author | Doise, J. | |
dc.contributor.author | Kocsis, M. | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | Kljucar, Luka | |
dc.contributor.author | Das, Poulomi | |
dc.contributor.author | Blanc, Romuald | |
dc.contributor.author | Beral, Christophe | |
dc.contributor.author | Severi, Joren | |
dc.contributor.author | Vandenbroeck, Nadia | |
dc.contributor.author | Foubert, Philippe | |
dc.contributor.author | Charley, Anne-Laure | |
dc.contributor.author | Oak, Apoorva | |
dc.contributor.author | Xu, Dongbo | |
dc.contributor.author | Gillijns, Werner | |
dc.contributor.author | Mitard, Jerome | |
dc.contributor.author | Tokei, Zsolt | |
dc.contributor.author | van der Veen, Marleen | |
dc.contributor.author | Heylen, Nancy | |
dc.contributor.author | Teugels, Lieve | |
dc.contributor.author | Le, Quoc Toan | |
dc.contributor.author | Schleicher, Filip | |
dc.contributor.author | Leray, Philippe | |
dc.contributor.author | Ronse, Kurt | |
dc.date.accessioned | 2022-03-11T13:03:50Z | |
dc.date.available | 2022-03-11T13:03:50Z | |
dc.date.issued | 2021 | |
dc.identifier.isbn | 978-1-5106-4051-1 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000672825700013 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39408 | |
dc.source | WOS | |
dc.title | 28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | Kljucar, Luka | |
dc.contributor.imecauthor | Das, Poulomi | |
dc.contributor.imecauthor | Blanc, Romuald | |
dc.contributor.imecauthor | Beral, Christophe | |
dc.contributor.imecauthor | Severi, Joren | |
dc.contributor.imecauthor | Vandenbroeck, Nadia | |
dc.contributor.imecauthor | Foubert, Philippe | |
dc.contributor.imecauthor | Charley, Anne-Laure | |
dc.contributor.imecauthor | Oak, Apoorva | |
dc.contributor.imecauthor | Xu, Dongbo | |
dc.contributor.imecauthor | Gillijns, Werner | |
dc.contributor.imecauthor | Mitard, Jerome | |
dc.contributor.imecauthor | Tokei, Zsolt | |
dc.contributor.imecauthor | van der Veen, Marleen | |
dc.contributor.imecauthor | Heylen, Nancy | |
dc.contributor.imecauthor | Teugels, Lieve | |
dc.contributor.imecauthor | Le, Quoc Toan | |
dc.contributor.imecauthor | Schleicher, Filip | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.orcidimec | Schleicher, F.::0000-0003-3630-7285 | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.contributor.orcidimec | Beral, Christophe::0000-0003-1356-9186 | |
dc.contributor.orcidimec | Oak, Apoorva::0000-0002-0926-848X | |
dc.contributor.orcidimec | Xu, Dongbo::0000-0003-1159-2315 | |
dc.contributor.orcidimec | Gillijns, Werner::0000-0002-2430-7360 | |
dc.contributor.orcidimec | Mitard, Jerome::0000-0002-7422-079X | |
dc.contributor.orcidimec | van der Veen, Marleen::0000-0002-9402-8922 | |
dc.contributor.orcidimec | Teugels, Lieve::0000-0002-6613-9414 | |
dc.contributor.orcidimec | Le, Quoc Toan::0000-0002-0206-6279 | |
dc.contributor.orcidimec | Schleicher, Filip::0000-0003-3630-7285 | |
dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
dc.identifier.doi | 10.1117/12.2584713 | |
dc.identifier.eisbn | 978-1-5106-4052-8 | |
dc.source.numberofpages | 11 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 116090Q | |
dc.source.conference | Conference on Extreme Ultraviolet (EUV) Lithography XII | |
dc.source.conferencedate | FEB 22-26, 2021 | |
dc.source.conferencelocation | Virtual | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 11609 | |
imec.availability | Published - imec | |