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28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography

dc.contributor.authorKim, Il Hwan
dc.contributor.authorKim, Insung
dc.contributor.authorPark, Changmin
dc.contributor.authorLee, Jsiun
dc.contributor.authorRyu, Koungmin
dc.contributor.authorDe Schepper, P.
dc.contributor.authorDoise, J.
dc.contributor.authorKocsis, M.
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorKljucar, Luka
dc.contributor.authorDas, Poulomi
dc.contributor.authorBlanc, Romuald
dc.contributor.authorBeral, Christophe
dc.contributor.authorSeveri, Joren
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorFoubert, Philippe
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorOak, Apoorva
dc.contributor.authorXu, Dongbo
dc.contributor.authorGillijns, Werner
dc.contributor.authorMitard, Jerome
dc.contributor.authorTokei, Zsolt
dc.contributor.authorvan der Veen, Marleen
dc.contributor.authorHeylen, Nancy
dc.contributor.authorTeugels, Lieve
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorSchleicher, Filip
dc.contributor.authorLeray, Philippe
dc.contributor.authorRonse, Kurt
dc.date.accessioned2022-03-11T13:03:50Z
dc.date.available2022-03-11T13:03:50Z
dc.date.issued2021
dc.identifier.isbn978-1-5106-4051-1
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000672825700013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39408
dc.sourceWOS
dc.title28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography
dc.typeProceedings paper
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorKljucar, Luka
dc.contributor.imecauthorDas, Poulomi
dc.contributor.imecauthorBlanc, Romuald
dc.contributor.imecauthorBeral, Christophe
dc.contributor.imecauthorSeveri, Joren
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorOak, Apoorva
dc.contributor.imecauthorXu, Dongbo
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorvan der Veen, Marleen
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.imecauthorTeugels, Lieve
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorSchleicher, Filip
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecSchleicher, F.::0000-0003-3630-7285
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecBeral, Christophe::0000-0003-1356-9186
dc.contributor.orcidimecOak, Apoorva::0000-0002-0926-848X
dc.contributor.orcidimecXu, Dongbo::0000-0003-1159-2315
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecvan der Veen, Marleen::0000-0002-9402-8922
dc.contributor.orcidimecTeugels, Lieve::0000-0002-6613-9414
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecSchleicher, Filip::0000-0003-3630-7285
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.identifier.doi10.1117/12.2584713
dc.identifier.eisbn978-1-5106-4052-8
dc.source.numberofpages11
dc.source.peerreviewyes
dc.source.beginpage116090Q
dc.source.conferenceConference on Extreme Ultraviolet (EUV) Lithography XII
dc.source.conferencedateFEB 22-26, 2021
dc.source.conferencelocationVirtual
dc.source.journalProceedings of SPIE
dc.source.volume11609
imec.availabilityPublished - imec


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