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Enabling Non-Actinic EUV Mask Inspection using CNT Pellicle

dc.contributor.authorKeshet, Mor
dc.contributor.authorGershon, Dor
dc.contributor.authorMalul, Uriel
dc.contributor.authorBlinder, Yaniv
dc.contributor.authorOrr, Yonatan
dc.contributor.authorTam, Aviram
dc.contributor.authorSantoro, Gaetano
dc.contributor.authorHouchens, Kevin
dc.contributor.authorGallagher, Emily
dc.contributor.authorTimmermans, Marina
dc.contributor.authorFrommhold, Andreas
dc.contributor.authorLorusso, Gian
dc.date.accessioned2022-03-11T13:15:20Z
dc.date.available2022-03-11T13:15:20Z
dc.date.issued2021
dc.identifier.isbn978-1-5106-4051-1
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000672825700022
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39410
dc.sourceWOS
dc.titleEnabling Non-Actinic EUV Mask Inspection using CNT Pellicle
dc.typeProceedings paper
dc.contributor.imecauthorGallagher, Emily
dc.contributor.imecauthorTimmermans, Marina
dc.contributor.imecauthorFrommhold, Andreas
dc.contributor.imecauthorLorusso, Gian
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.contributor.orcidimecFrommhold, Andreas::0000-0001-6824-5643
dc.contributor.orcidimecTimmermans, Marina::0000-0001-9805-8259
dc.identifier.doi10.1117/12.2584695
dc.identifier.eisbn978-1-5106-4052-8
dc.source.numberofpages9
dc.source.peerreviewyes
dc.source.beginpage1160910
dc.source.conferenceConference on Extreme Ultraviolet (EUV) Lithography XII
dc.source.conferencedateFEB 22-26, 2021
dc.source.conferencelocationVirtual
dc.source.journalProceedings of SPIE
dc.source.volume11609
imec.availabilityPublished - imec


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