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IMAGING OF OVERLAY AND ALIGNMENT MARKERS UNDER OPAQUE LAYERS USING PICOSECOND LASER ACOUSTIC MEASUREMENTS AM: Advanced Metrology

dc.contributor.authorMehendale, M.
dc.contributor.authorAntonelli, A.
dc.contributor.authorMair, R.
dc.contributor.authorMukundhan, P.
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorLeray, Philippe
dc.contributor.authorYasin, Farrukh
dc.contributor.authorCrotti, Davide
dc.date.accessioned2022-03-16T13:26:18Z
dc.date.available2022-03-16T13:26:18Z
dc.date.issued2021
dc.identifier.issn1078-8743
dc.identifier.otherWOS:000680838600001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39449
dc.sourceWOS
dc.titleIMAGING OF OVERLAY AND ALIGNMENT MARKERS UNDER OPAQUE LAYERS USING PICOSECOND LASER ACOUSTIC MEASUREMENTS AM: Advanced Metrology
dc.typeProceedings paper
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorYasin, Farrukh
dc.contributor.imecauthorCrotti, Davide
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.contributor.orcidimecYasin, Farrukh::0000-0002-7295-0254
dc.identifier.doi10.1109/ASMC51741.2021.9435649
dc.identifier.eisbn978-1-7281-8645-0
dc.source.numberofpages4
dc.source.peerreviewyes
dc.source.conference32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
dc.source.conferencedateMAY 10-12, 2021
dc.source.conferencelocationVirtual
dc.source.journalna
imec.availabilityPublished - imec


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