dc.contributor.author | Veloso, Anabela | |
dc.contributor.author | Eneman, Geert | |
dc.contributor.author | De Keersgieter, An | |
dc.contributor.author | Jang, Doyoung | |
dc.contributor.author | Mertens, Hans | |
dc.contributor.author | Matagne, Philippe | |
dc.contributor.author | Dentoni Litta, Eugenio | |
dc.contributor.author | Ryckaert, Julien | |
dc.contributor.author | Horiguchi, Naoto | |
dc.date.accessioned | 2022-03-16T13:54:18Z | |
dc.date.available | 2022-03-16T13:54:18Z | |
dc.date.issued | 2021 | |
dc.identifier.issn | na | |
dc.identifier.other | WOS:000675595800128 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39454 | |
dc.source | WOS | |
dc.title | Nanosheet FETs and their Potential for Enabling Continued Moore's Law Scaling | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Veloso, Anabela | |
dc.contributor.imecauthor | Eneman, Geert | |
dc.contributor.imecauthor | De Keersgieter, An | |
dc.contributor.imecauthor | Jang, Doyoung | |
dc.contributor.imecauthor | Mertens, Hans | |
dc.contributor.imecauthor | Matagne, Philippe | |
dc.contributor.imecauthor | Dentoni Litta, Eugenio | |
dc.contributor.imecauthor | Ryckaert, Julien | |
dc.contributor.imecauthor | Horiguchi, Naoto | |
dc.contributor.orcidimec | Eneman, Geert::0000-0002-5849-3384 | |
dc.contributor.orcidimec | De Keersgieter, An::0000-0002-5527-8582 | |
dc.contributor.orcidimec | Dentoni Litta, Eugenio::0000-0003-0333-376X | |
dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
dc.identifier.doi | 10.1109/EDTM50988.2021.9420942 | |
dc.identifier.eisbn | 978-1-7281-8176-9 | |
dc.source.numberofpages | 3 | |
dc.source.peerreview | yes | |
dc.source.conference | 5th IEEE Electron Devices Technology and Manufacturing Conference (EDTM) | |
dc.source.conferencedate | APR 08-11, 2021 | |
dc.source.conferencelocation | Chengdu | |
dc.source.journal | na | |
imec.availability | Published - imec | |