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CD-control comparison for sub-0.18μm patterning using 248 nm lithography and strong resolution enhancement techniques

dc.contributor.authorVandenberghe, Geert
dc.contributor.authorMarschner, Thomas
dc.contributor.authorRonse, Kurt
dc.contributor.authorSocha, R.
dc.contributor.authorDusa, M.
dc.date.accessioned2021-10-14T11:49:46Z
dc.date.available2021-10-14T11:49:46Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3952
dc.sourceIIOimport
dc.titleCD-control comparison for sub-0.18μm patterning using 248 nm lithography and strong resolution enhancement techniques
dc.typeProceedings paper
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage228
dc.source.endpage238
dc.source.conferenceOptical Microlithography XII
dc.source.conferencedate14/03/1999
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 3679


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