dc.contributor.author | Vandervorst, Wilfried | |
dc.contributor.author | Clarysse, Trudo | |
dc.contributor.author | De Wolf, Peter | |
dc.contributor.author | Eyben, Pierre | |
dc.contributor.author | Haegeman, Bart | |
dc.contributor.author | Xu, Mingwei | |
dc.contributor.author | Trenkler, Thomas | |
dc.contributor.author | Hantschel, Thomas | |
dc.contributor.author | Stephenson, Robert | |
dc.date.accessioned | 2021-10-14T11:50:34Z | |
dc.date.available | 2021-10-14T11:50:34Z | |
dc.date.issued | 1999 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3960 | |
dc.source | IIOimport | |
dc.title | Nanometer scale characterization of deep submicron devices | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Vandervorst, Wilfried | |
dc.contributor.imecauthor | Eyben, Pierre | |
dc.contributor.imecauthor | Hantschel, Thomas | |
dc.contributor.orcidimec | Hantschel, Thomas::0000-0001-9476-4084 | |
dc.source.peerreview | no | |
dc.source.conference | Materials Research Society Spring Meeting: Symposium S on Si Front-End Processing - Physics and Technology of Dopant-Defect Inte | |
dc.source.conferencelocation | | |
imec.availability | Published - imec | |