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High resolution dopant/carrier profiling for deep submicron technologies

dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorClarysse, Trudo
dc.contributor.authorDe Wolf, Peter
dc.contributor.authorEyben, Pierre
dc.contributor.authorHaegeman, Bart
dc.contributor.authorXu, Mingwei
dc.contributor.authorTrenkler, Thomas
dc.contributor.authorHantschel, Thomas
dc.contributor.authorStephenson, Robert
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Witte, Hilde
dc.date.accessioned2021-10-14T11:50:41Z
dc.date.available2021-10-14T11:50:41Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3961
dc.sourceIIOimport
dc.titleHigh resolution dopant/carrier profiling for deep submicron technologies
dc.typeOral presentation
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorHantschel, Thomas
dc.contributor.imecauthorConard, Thierry
dc.contributor.orcidimecHantschel, Thomas::0000-0001-9476-4084
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.source.peerreviewno
dc.source.conference9th Canadian Semiconductor Technology Conference; July 1999; Ottawa, Canada.
dc.source.conferencelocation
imec.availabilityPublished - imec


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