Secondary electron distribution and photosensitivity performance of resists for extreme ultraviolet (EUV)
dc.contributor.author | Rezvani, Javid | |
dc.contributor.author | Tchoudinov, Georghii | |
dc.contributor.author | Nannarone, Stefano | |
dc.contributor.author | Fallica, Roberto | |
dc.date.accessioned | 2022-05-06T09:22:06Z | |
dc.date.available | 2022-04-15T12:01:10Z | |
dc.date.available | 2022-05-06T09:22:06Z | |
dc.date.issued | 2022-03-17 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39628.2 | |
dc.title | Secondary electron distribution and photosensitivity performance of resists for extreme ultraviolet (EUV) | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Fallica, Roberto | |
dc.contributor.orcidimec | Fallica, Roberto::0000-0003-4523-9624 | |
dc.source.peerreview | no | |
dc.subject.discipline | Applied physics | |
dc.source.conference | CECAM | |
dc.source.conferencedate | 2022-03-17 | |
dc.source.conferencelocation | Lausanne | |
imec.availability | Published - imec |
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