dc.contributor.author | Lei, W. | |
dc.contributor.author | Pethe, S. | |
dc.contributor.author | Hwang, S. | |
dc.contributor.author | Chen, F. | |
dc.contributor.author | Wu, Z. | |
dc.contributor.author | Machillot, J. | |
dc.contributor.author | Cockburn, A. | |
dc.contributor.author | Jansen, A. | |
dc.contributor.author | van der Veen, Marleen | |
dc.contributor.author | Varela Pedreira, Olalla | |
dc.contributor.author | Heylen, Nancy | |
dc.contributor.author | Jourdan, Nicolas | |
dc.contributor.author | Lariviere, Stephane | |
dc.contributor.author | Park, Seongho | |
dc.contributor.author | Struyf, Herbert | |
dc.contributor.author | Tokei, Zsolt | |
dc.date.accessioned | 2022-05-05T09:10:06Z | |
dc.date.available | 2022-05-05T02:17:28Z | |
dc.date.available | 2022-05-05T09:10:06Z | |
dc.date.issued | 2021 | |
dc.identifier.issn | 2380-632X | |
dc.identifier.other | WOS:000784773200026 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39744.2 | |
dc.source | WOS | |
dc.title | Exploring W-Cu hybrid dual damascene metallization for future nodes | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | van der Veen, Marleen | |
dc.contributor.imecauthor | Varela Pedreira, Olalla | |
dc.contributor.imecauthor | Heylen, Nancy | |
dc.contributor.imecauthor | Jourdan, Nicolas | |
dc.contributor.imecauthor | Lariviere, Stephane | |
dc.contributor.imecauthor | Park, Seongho | |
dc.contributor.imecauthor | Struyf, Herbert | |
dc.contributor.imecauthor | Tokei, Zsolt | |
dc.contributor.orcidimec | van der Veen, Marleen::0000-0002-9402-8922 | |
dc.identifier.doi | 10.1109/IITC51362.2021.9537410 | |
dc.identifier.eisbn | 978-1-7281-7632-1 | |
dc.source.numberofpages | 3 | |
dc.source.peerreview | yes | |
dc.source.conference | IEEE International Interconnect Technology Conference (IITC) | |
dc.source.conferencedate | JUL 06-09, 2021 | |
dc.source.conferencelocation | Virtual | |
dc.source.journal | na | |
imec.availability | Published - imec | |