Notice
This item has not yet been validated by imec staff.
Notice
This is not the latest version of this item. The latest version can be found at: https://imec-publications.be/handle/20.500.12860/39864.7
Analysis of advanced technology nodes and h-NA EUV introduction: a cost perspective
dc.contributor.author | Mirabelli, Gioele | |
dc.contributor.author | Wang, Jane | |
dc.contributor.author | Trivkovic, Darko | |
dc.contributor.author | Weckx, Pieter | |
dc.contributor.author | Spessot, Alessio | |
dc.contributor.author | Ronse, Kurt | |
dc.contributor.author | Kim, Ryoung-Han | |
dc.contributor.author | Hellings, Geert | |
dc.contributor.author | Ryckaert, Julien | |
dc.date.accessioned | 2022-05-30T13:16:05Z | |
dc.date.available | 2022-05-22T02:19:05Z | |
dc.date.available | 2022-05-30T13:16:05Z | |
dc.date.issued | 2021 | |
dc.identifier.isbn | 978-1-5106-4552-3 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000792657300007 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39864.2 | |
dc.source | WOS | |
dc.title | Analysis of advanced technology nodes and h-NA EUV introduction: a cost perspective | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Mirabelli, Gioele | |
dc.contributor.imecauthor | Wang, Jane | |
dc.contributor.imecauthor | Trivkovic, Darko | |
dc.contributor.imecauthor | Weckx, Pieter | |
dc.contributor.imecauthor | Spessot, Alessio | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.imecauthor | Kim, Ryoung-Han | |
dc.contributor.imecauthor | Hellings, Geert | |
dc.contributor.imecauthor | Ryckaert, Julien | |
dc.contributor.orcidimec | Mirabelli, Gioele::0000-0001-7060-4836 | |
dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
dc.contributor.orcidimec | Hellings, Geert::0000-0002-5376-2119 | |
dc.identifier.doi | 10.1117/12.2600804 | |
dc.identifier.eisbn | 978-1-5106-4553-0 | |
dc.source.numberofpages | 10 | |
dc.source.peerreview | yes | |
dc.source.conference | International Conference on Extreme Ultraviolet Lithography | |
dc.source.conferencedate | SEP 27-OCT 01, 2021 | |
dc.source.conferencelocation | Online | |
dc.source.journal | Proceedings Volume 11854, International Conference on Extreme Ultraviolet Lithography | |
dc.source.volume | 11854 | |
imec.availability | Under review |
Files in this item
Files | Size | Format | View |
---|---|---|---|
There are no files associated with this item. |